Advanced Brush

Explanation

All products manufactured by Ruixintai Precision are based on standards for pollution control, critical cleaning, and physical properties. We perform ICP-Master, chromatography, liquid particle count tests to verify and ensure cleanliness meets the quality specifications. We apply proprietary flow-based cleaning process, which is specifically designed to meet rigid requirements for ≤28nm cleaning after CMP, especially for ≤14/16nm generation after the CMP process, the pre-running-in time can be shortened, water flow can easily flow through the top of the nodule on the metal film BEoL-CMP, and more contact area can be obtained by chamfering the nodule surface during the cleaning process.

Brush uniformity

The excellent dimensional uniformity makes it possible to process small gaps without compromising particle removal efficiency.                                           

Torque stability                                                                                            

Stable interlocking brush core assemblies provide low vibration and consistent torque performance.

Uniform fluid distribution

Uniform contact pressure results in a more uniform fluid distribution, which reduces the point-of-use chemical concentration gradient on the wafer.

Our brushes are compatible with all major CMP original equipment manufacturers, the mandels and device interfaces are designed to be quick and easy to install. To prevent bacterial growth and ensure a long shelf life, the brushes are stored in H2O2 or NH4OH.According to the application and cleaning requirements, the brushes can be customized in a variety of nodule shapes to solve common problems in the CMP process.